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UV/O3 cleaner; UV ozone cleaner
UV-1 is a research and development cleaning device designed to efficiently perform complete dry processing of various semiconductor processes, such as photoresist ashing, silicon wafer cleaning, and chrome mask cleaning, through the interaction of high-concentration ozone and ultraviolet irradiation.
UV/O3 cleaner; UV ozone cleaner
The UV-300 is a cleaning device developed to efficiently perform complete dry processing of various semiconductor processes, such as photoresist ashing, silicon wafer cleaning, and chrome mask cleaning, through the interaction of high-concentration ozone and ultraviolet irradiation.
UV/O3 Cleaner - UV Ozone Cleaner
The UV-300H is a cleaning device developed to efficiently perform complete dry processing of various semiconductor processes such as photoresist ashing, silicon wafer cleaning, and chrome mask cleaning through the interaction of high-concentration ozone and ultraviolet irradiation. This device enables faster processing compared to conventional UV/O3 treatment.
